Acquisition of a Scanning Electron Microscope for Electron Beam Lithography

DURIP: Request for Lithography and Metallization Equipment

Multicolor Lithography for High Efficiency, Low Insertion Loss NLO polymer Devices

Roll-to-Roll, Projection Lithography System for High-Resolution Patterning of Flexible Substrates, Volume 1

High Speed, High Accuracy Stage for Advanced Lithography. Phase I

Point Source X-Ray Lithography System for Sub-0.15 Micron Design Rules

Self-Assembly Based Approaches to Microelectronic Fabrication and Devices: Surface Passivation, Soft Lithography, Electrically Functional Systems, and Hierarchical Self-Assembly

Scanning Probe Lithography. 4. Effect of Scanning Tunneling Microscope Tip Parameters on Lithographic Patterns in Self-Assembling Monolayers

Low Voltage Electron Beam Lithography

Electron Specimen Interaction in Low Voltage Electron Beam Lithography