Condition - Very Good
The item shows wear from consistent use, but it remains in good condition and functions properly. Item may arrive with damaged packaging or be repackaged. It may be marked, have identifying markings on it, or have minor cosmetic damage. It may also be missing some parts/accessories or bundled items.
Resolution Enhancement Techniques in Optical Lithography (SPIE Tutorial Texts in Optical Engineering Vol. TT47)
- Used Book in Good Condition
This tutorial summarizes optical lithography enhancement research and development over the past 20 years. Discusses theoretical and practical aspects of commonly used techniques, including optical imaging and resolution, modified illumination, optical proximity correction, alternating and attenuating phase-shifting masks, selecting RETs, and second-generation RETs. Useful for students and practicing lithographers.Contents
- Foreword
- Preface
- List of symbols
- Introduction
- Optical imaging and resolution
- Modified illumination
- Optical proximity correction
- Alternating phase-shifting mask
- Attenuated phase-shift mask
- Selecting appropriate RETs
- Second-generation RETs
- Concluding remarks
- k1 conversion charts
- Bibliography
- Index
